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产品中心 > 晶体硅电池线工艺设备 > 管式等离子体淀积炉

管式等离子体淀积炉

设备名称 Equipment Name

管式等离子体淀积炉  Horizontal PECVD

设备型号 Equipment Model

PD-520

设备用途 Equipment Application

主要用于晶体硅太阳能电池制造中电池片的减反射膜生长,也可用于在电池片的背面沉积钝化膜。
Mainly used for generates highest quality anti-refiective coatings in the production of crystal silicon solar cells, and for deposition of passivation film on the rear side of solar cells.

工艺流程 Process Flow

石墨舟及硅片准备→管内充氮气→进舟→抽真空、压力测试→氨气预清理和检查→管路抽真空、测漏、恒温→预镀膜→镀膜→抽真空、压力测试→清管路、充氮气→退舟
Graphite boat & wafers ready→Nitrogen inlet→Graphite boat load in→Vacuumize, pressure test→Ammonia pre-clean and check→Vacuumize the tube,leak-checking , constant temperature→Pre-coating→Coating→Vacuumize,pressure test→Tube cleaning and Nitrogen inlet→Graphite boat unload


技术特点  Features

1、兼容氮氧化硅PERC技术。
Compatible with SiOxNy PERC process.

2、双水冷密封技术。
Double cooling water flanges sealing technology.

3、专利内加热技术。
Patented internal heating technology.

4、高速平稳整体模组推舟机构。
High-speed integral module boat pushing mechanism.

5、悬浮承载舟技术。
Graphite boat contact-free with quartz tube.

6、自主知识产权MES软件。
MES software with independent intellectual property right.

7、自主开发中央计算机集中控制系统。
Independently developed CCC system.

8、快速镀膜技术。
Fast coating technology.

9、全面的防超温、断偶、撞舟等安全报警保护功能。

Alarm protection for over-heating, thermocouple -break and boat collision. 


设备参数  Parameters